复合磨粒抛光技术研究现状与展望:复合磨粒抛光技术研究现状与展望
Research and Prospect of Composite Abrasive Polishing Technology
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作 者:朱良健 滕霖 白满社
ZHU Liangjian, TENG Lin, BAI Manshe (AVIC Xi'an Flight Automatic Control Research Institute, Xi~an 710065)
机构地区:中国航空飞行自动控制研究所,西安710065
出 处:《材料导报》 CSCD 2014年第28卷第13期 122-125页,共4页
Materials Review
基 金:航空重点基金(20130818005)
摘 要:复合磨粒抛光技术具有抛光速率高、面形精度好、表面缺陷少等优点,已成为当前的研究热点.综述了复合磨粒抛光技术中核壳型复合磨粒的制备方法、表征技术和作用机理的研究现状,指出了当前复合磨粒抛光技术存在的问题与不足,并对其发展方向进行了展望.
Composite abrasive polishing has becoming the research focus due to the high polishing rate, high surface figure accuracy and less surface defects. The preparation method, characterization technique of core-shell structured composite abrasives and the function mechanism in polishing are reviewed. The problems and insufficiency of the present studies, the future trend of the technology are discussed.
关键词:抛光 复合磨粒 核壳型
polishing, composite abrasive, core-shell structured ;